Color filter panel and its fabrication method using back exposure

ABSTRACT

A fabrication method for a color filter panel of a display device is provided. The method includes forming a black matrix layer having a first opening on a substrate; forming a color filter layer on the substrate; forming an organic layer on the color filter layer and in the first opening; and forming a spacer by back-exposing the organic layer through the first opening.

The present application claims, under 35 U.S.C. § 119, the prioritybenefit of Patent Application No. 2003-83772 filed in Republic of Koreaon Nov. 24, 2003, the entire contents of which are herein fullyincorporated by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a fabrication method of a liquidcrystal display (LCD) device, and more particularly, to a fabricationmethod of an LCD device for forming a color filter panel with a reducednumber of mask processes.

2. Description of the Related Art

Generally, an LCD device is for displaying an image by using a liquidcrystal driven by an applied signal, and is largely composed of an upperplate, a lower plate, and a liquid crystal between the upper and lowerplates.

The upper plate is generally known as a color filter substrate/panel fordisplaying an image in colors. The lower plate is generally known as athin film transistor (TFT) array substrate/panel having unit pixelsarranged in a matrix form and provided with TFTs at each unit pixel as aswitching device.

The structure of an LCD panel constituted with an upper plate 200 and alower plate 100 will be explained with reference to FIG. 1.

As shown in FIG. 1, in the lower plate (TFT array panel) 100, aplurality of gate lines 101 arranged in parallel cross perpendicularly aplurality of data lines 102 arranged in parallel on a lower substrate105. Intersection regions between the gate lines 101 and the data lines102 are defined as unit pixel regions, where the unit pixel regions arearranged in a matrix form on the lower substrate 105. At eachintersection region between the gate lines 101 and the data lines 102, aswitching device 103 for driving the corresponding unit pixel is formed.As the switching device, a TFT is generally used. The TFT includes agate electrode, a source electrode, a drain electrode, and a channellayer. The gate electrode and the source/drain electrodes arerespectively connected to the corresponding gate line 101 and thecorresponding data line 102.

For each unit pixel region, a pixel electrode 104 for applying anelectric field to a liquid crystal 110 is formed at the lower substrate105. An alignment layer (not shown) for the initial alignment of theliquid crystal 110 is formed on the pixel electrodes 104 over the entiresurface of the lower substrate 105. As the alignment layer, apolyimide-based organic layer is used. The initial alignment of theliquid crystal 110 is performed by depositing the alignment layer andperforming a rubbing process for rubbing the alignment layer withcotton.

A spacer (not shown) for evenly maintaining a gap between the lowerplate 100 and the upper plate 200 is arranged on the alignment layer. Asealant for bonding the upper plate 200 and the lower plate 100 andpreventing the liquid crystal 110 from being leaked is formed at theperiphery of the pixel region of the lower plate 100.

The structure of the upper plate 200 opposing the lower plate 100 anddisplaying information in colors will be explained.

In the upper plate 200, a black matrix 202 for shielding unnecessarylight among the light irradiated from the lower plate 100 is provided ina matrix form. On the black matrix 202, a color filter layer 203 fordisplaying an image in colors is provided. The color filter layer 203 iscomposed of R, G, and B sub color filter layers each corresponding toone of the unit pixel regions.

An overcoat layer 204 for compensating any step in the color filterlayer 203 may be provided on the color filter layer 203. A commonelectrode 205 for applying an electric field to the liquid crystal 110with the pixel electrodes 104 formed at the lower plate 100 is providedon the overcoat layer 204. On the common electrode 205, an alignmentlayer (not shown) for the initial alignment of the liquid crystal 110 isprovided. A spacer (not shown) for maintaining a cell gap between theupper plate 200 and the lower plate 100 may be provided on thisalignment layer. As known, a spacer can be provided either at the upperplate 200 or at the lower plate 100.

FIG. 2 shows the structure of the upper plate (color filter panel) 200of the LCD device of FIG. 1 in more detail.

Referring to FIG. 2, on a substrate 201 of a transparent material, theblack matrix 202 is provided. The black matrix 202 is formed of a metalthin film or a resin, and is arranged in a matrix form so as tocorrespond to the gate lines 101 and data lines 102 formed on the lowersubstrate 105. A color resin as the color filter layer 203 fordisplaying an image in colors is formed in a pixel region defined by theblack matrix 202. The color resin is composed of R, G, and B colors, andis arranged to correspond to each unit pixel. On the color filter layer203, the transparent overcoat layer 204 for compensating steps in thecolor filter layer 203 and protecting the color filter layer 203 isprovided. On the overcoat layer 204, the common electrode 205 composedof a transparent material for applying an electric field to the liquidcrystal 110 is provided. On the common electrode 205, a spacer 206 formaintaining a cell gap of the LCD device is formed. On the spacer 206,an alignment layer 207 for the initial alignment of the liquid crystal110 injected between the color filter panel 200 and the TFT array panel100 is provided.

The fabrication process of the color filter panel 200 of FIG. 2 will beexplained in more detail with reference to FIGS. 3A to 3D.

Generally, a metal material or a resin for forming a black matrix isformed on a transparent substrate. The black matrix is formed between R,G, and B sub color filter layers and shields light passing through areverse tilt domain formed at the periphery portion of a pixel electrodeof a TFT array panel. As the material of the black matrix, a metal thinlayer such as Cr having an optical density more than 3.5 or an organicmaterial such as carbon are generally used. A double layer such asCr/CrOx may be used for a low reflection. In case of using a metal thinlayer, the black matrix may be formed in a certain pattern by aphotolithography process applying an exposure process using a mask. Onthe other hand, in case of using a resin of an organic material, theblack matrix may be formed in a certain pattern by an exposure processusing a mask and a development process.

More specifically, FIG. 3A shows the black matrix 202 of a certainpattern formed on the substrate 201. In order to form the black matrix202 on the substrate 201, a first mask including a black matrix patternis needed and used.

After forming the black matrix 202, as shown in FIG. 3B, the colorfilter layer 203 composed of R, G, and B colors for displaying an imagein colors is formed. The color filter layer 203 composed of R, G, and Bsub color filter layers is formed such that each sub color filter layercorresponds to one of the unit pixels. The color filter layer 203 can befabricated by using one of several methods such as a dyeing method, anelectrodepositing method, a pigment dispersing method, a printingmethod, etc. Herein, the fabrication method of the color filter layer203 by using the pigment dispersing method will be explained.

According to the pigment dispersing method, first, one of R, G, and Bcolor resins is deposited on the substrate 201 where the black matrix202 is formed. Here the color resins are deposited in the order of R, G,and B colors. Then, a selective exposure is performed on the resultingstructure thereby to form a red sub color filter layer 203 a. Then, agreen color resin is deposited on the substrate 201 having the red subcolor filter layer 203 a, and a selective etching is performed thus topattern and form a green sub color filter layer 203 b at a correspondingregion. Then a blue color resin is deposited and selectively etched toform a blue sub color filter layer 203 c.

Alternatively, the color filter layer 203 may be formed by applying asecond mask and repeating the exposure process. That is, in order toform the R, G, and B sub color filter layers 203 a, 203 b, 203 c, themask process composed of an exposure, a development, and a cleaning isperformed three times.

After forming the color filter layer 203 by performing the mask processthree times, as shown in FIG. 3C, the transparent overcoat layer 204 ofan organic layer for compensating the steps in the color filter layer203 is formed. If an organic layer is used as the black matrix 202, theovercoat layer 204 is absolutely necessary since the steps in the colorfilter layer 203 are greatly generated. But if a metal thin film is usedas the back matrix 202, the overcoat layer 204 may not be needed sincethe black matrix 202 is formed as a thin film.

After forming the overcoat layer 204, a transparent electrode as anindium tin oxide (ITO) layer for applying an electric field to theliquid crystal 110 is formed. This ITO layer serves as the commonelectrode 205.

Then, the spacer 206 for maintaining a cell gap of the LCD device isformed on the common electrode 205. The spacer 206 is formed by using adispersion method for dispersing balls on the substrate or by using apatterning method which can be used to vary the size, height andposition of the spacer parts.

The dispersion method is divided into a wet dispersion method fordispersing a spacer by mixing with alcohol, and a dry dispersion methodfor dispersing only the spacer. The dry dispersion method includes astatic dispersion method using static electricity and an antistaticdispersion method using gas pressure. The antistatic dispersion methodis mainly used in the liquid crystal cell structure susceptible tostatic electricity. By the dispersion method, the size, the height, andthe position of the dispersed spacer balls may not be varied, but acolumn spacer or a patterned spacer for increasing an opening ratio isused.

According to the patterning method for the spacer 206, a photosensitiveresin is deposited on the common electrode 205 and an exposure processusing a mask, a development process, and a cleaning process areperformed thereto to form the spacer 206 of a certain pattern. Thus, toform the spacer 206, additional mask processes are required.

After forming the spacer 206 on the common electrode 205, an organiclayer such as polyimide is deposited thereon for the initial alignmentof the liquid crystal, and a rubbing is performed in a certain directionthus to form the alignment layer 207. This completes the fabrication ofthe color filter panel of the LCD device.

However, as aforementioned, since a large number of mask processes arerequired at the time of fabricating the related art color filter panel,the processes are delayed and the productivity of the LCD device isreduced. One mask process includes a series of processes such as adeposition process of a photosensitive resin, an exposure process, acleaning process, etc. Therefore, it is advantageous to reduce thenumber of mask processes needed, so as to reduce the fabrication cost ofthe LCD device and to enhance the productivity of the LCD device.

SUMMARY OF THE INVENTION

Accordingly, the present invention provides a fabrication method for acolor filter panel of an LCD device which overcomes the problems andlimitations of the related art fabrication methods.

Further, an object of the present invention is to provide a fabricationmethod of a color filter panel capable of simplifying the process byreducing the number of masks used and capable of reducing thefabrication cost.

To achieve these and other advantages and in accordance with the purposeof the present invention, as embodied and broadly described herein,there is provided a fabrication method for a color filter panel of adisplay device, the method comprising: forming a black matrix layerhaving a first opening on a substrate; forming a color filter layer onthe substrate; forming an organic layer on the color filter layer and inthe first opening; and forming a spacer by back-exposing the organiclayer through the first opening.

To achieve these and other advantages and in accordance with the purposeof the present invention, as embodied and broadly described herein,there is also provided a color filter panel for a display device, thecolor filter panel comprising: a substrate; a black matrix layer on thesubstrate and having a first opening; a color filter layer on thesubstrate; and a spacer in the first opening.

To achieve these and other advantages and in accordance with the purposeof the present invention, as embodied and broadly described herein,there is also provided a display device comprising: a thin filmtransistor (TFT) array panel; a color filter panel; and a liquid crystallayer between the TFT array panel and the color filter panel, whereinthe color filter panel includes a substrate, a black matrix on thesubstrate and having a first opening, a color filter layer on thesubstrate, and a spacer in the first opening.

The foregoing and other objects, features, aspects and advantages of thepresent invention will become more apparent from the following detaileddescription of the present invention when taken in conjunction with theaccompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the invention and are incorporated in and constitute apart of this specification, illustrate embodiments of the invention andtogether with the description serve to explain the principles of theinvention.

In the drawings:

FIG. 1 is a perspective view showing a schematic construction of aliquid crystal display (LCD) device in accordance with the related art;

FIG. 2 is a sectional view showing the structure of the color filterpanel of the LCD device of FIG. 1;

FIGS. 3A to 3D are views showing the fabrication process of the colorfilter panel of FIG. 2;

FIG. 4 is a sectional view showing a structure of a color filter panelof an LCD device according to one embodiment of the present invention;

FIG. 5 is a top plane view showing the structure of the color filterpanel of FIG. 4 according to the one embodiment of the presentinvention;

FIGS. 6A to 6E are views showing a fabrication process of the colorfilter panel of FIG. 4 according to an embodiment of the presentinvention; and

FIG. 7 is a sectional view of the color filter panel including anovercoat layer according to one embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Reference will now be made in detail to the preferred embodiments of thepresent invention, examples of which are illustrated in the accompanyingdrawings.

Hereinafter, the structure of a color filter panel of a display devicesuch as an LCD device according to one embodiment of the presentinvention will be explained with reference to FIGS. 4 to 5.

FIG. 4 is a sectional view showing the structure of a color filter panelof an LCD device according to one embodiment of the present invention.As shown, an opaque black matrix 402 of a matrix arrangement is formedon a transparent substrate 401. Through the parts of the black matrix402, a plurality of first openings 403 a for passing the lightirradiated from the TFT array panel are formed. As the material for theblack matrix 402, Cr, CrOx, or polymer resin may be used.

On the substrate 401 including the black matrix 402 having the firstopenings 403 a, a color filter layer 404 constituted with R, G, and Bsub color filter layers is provided. These R, G, and B sub color filterlayers correspond to unit pixels. The color filter layer 404 is formedbetween the strips of the black matrix 402 and on parts of the blackmatrix 402, or only between the strips of the black matrix 402. Throughthe parts of the color filer layer 404, a plurality of second openings403 b each connected directly to the corresponding first opening 403 aare formed. The second openings 403 b are formed to have a size equal toor larger than the first openings 403 a.

A common electrode 405 for applying an electric field to a liquidcrystal is formed over the color filter layer 404 and in the first andsecond openings 403 a and 403 b. The common electrode 405 may becomposed of an indium tin oxide (ITO) or an indium zinc oxide (IZO)which are transparent electrodes.

A spacer 406 for maintaining a cell gap of the LCD device is formed onthe common electrode 405 in the openings 403 (403 a and 403 b ). Thespacer 406 may be formed with various area densities according to thesize of the liquid crystal display panel, and can have various patterns,shapes and sizes. For instance, the spacer 406 can be composed of aplurality of spacer parts such as projections, ball-shaped parts, etc.An alignment layer 407 for the initial alignment of the liquid crystalis formed on the spacer 406.

The spacer 406 may be formed over the black matrix 402 and at the sametime at common corner regions between the sub color filter layers of thecolor filter layer 404. Therefore, the openings 403 may be formed at thecommon corner regions between the R, G, and B sub color filter layers.According to the position of the spacer parts of the spacer 406, theposition of the openings 403 is determined. The spacer 406 is preferablyopaque so that the light may not leak through the openings 403.

The color filter layer 404 may be an island type where the sub colorfilter layers are separated from one another, or a stripe type where thesame sub color filter layers are formed in columns.

In case of forming the common electrode 405 on the color filter layer404, the spacer 406 is in contact with the substrate 401 as the commonelectrode 405 is positioned between the spacer parts of the spacer 406.Therefore, the spacer 406 is formed of an opaque material so as not topass the light irradiated from the lower substrate of the TFT arraypanel.

FIG. 5 is a top plane view showing the structure of the color filterpanel of FIG. 4. Here, certain parts (such as the spacer 406) of thecolor filter panel in FIG. 4 are not shown to better illustrate theopenings 403. Each element 403 is composed of the first opening 403 aformed at the black matrix 402 and the second opening 403 b formed atthe color filter layer 404. As shown, the first openings 403 a arepreferably formed in the black matrix 402, especially at each commoncorner region 403 c of the sub color filter layers. However, theposition of the openings 403 is not limited to such common cornerregions.

The fabrication process of the color filter panel in FIGS. 4 and 5 willbe explained in more detail with reference to FIGS. 6A to 6E accordingto the present invention.

As shown in FIG. 6A, the black matrix 402 including the first openings403 a is formed on the transparent substrate 401. The black matrix 402including the first openings 403 a may be formed through a step offorming a thin film of a black matrix material on the substrate, a stepof depositing a photoresist (not shown) on the thin film of the blackmatrix material, and a step of photo-etching by applying a maskincluding an opening pattern corresponding to the first openings 403 a.In case that a metal such as Cr or CrOx is used as the black matrixmaterial, the photo-etching effective to form a metal pattern may beapplied. In case that a carbon black resin of a photosensitive organiclayer is used as the black matrix material, an exposure process using amask including the opening pattern corresponding to the first openings403 a, and a development process are performed thus to form the blackmatrix 402 including the first openings 403 a.

Then, as shown in FIG. 6B, the color filter layer 404 including thesecond openings 403 b is formed. The color filter layer 404 constitutedwith the R, G, and B sub color filter layers is formed to correspond tothe unit pixel regions. The color filter layer 404 is fabricated by oneof several methods such as a dyeing method, an electrodepositing method,a pigment dispersing method, a printing method, etc. Herein, thefabrication method of the color filter layer 404 by the pigmentdispersing method will be explained.

According to the pigment dispersing method, first, the R color resin isdeposited on the entire substrate 401 where the black matrix 402 hasbeen formed. Then, a selective exposure is performed on the resultingstructure thereby to form a red sub color filter layer. Then, a greencolor resin is deposited on the substrate where the red sub color filterlayer has been formed, and a selective etching is performed thus topattern and form a green sub color filter layer at a correspondingregion. This process is repeated for the blue color to form a blue subcolor filter layer. In this example, the color resins are deposited andformed in the order of R, G, B colors, but can be formed in other orderif desired. Also, the sub color filter layer may be an island type suchthat the sub color filter layers are separated from one another, or maybe a stripe type such that the same sub color filter layers are formedas a series.

During one process among the processes for forming the R, G, and B subcolor filter layers, the second openings 403 b are simultaneouslyformed. For instance, in case that the sub color filter layers of astripe type are used, the second openings 403 b above the first openings403 a can be formed by arranging the sub color filter layers to definethe second openings 403 b therebetween. Also, in case that adjacent subcolor filter layers are overlapped, the second openings 403 b may beformed at the overlapped sub color filter layer regions. FIGS. 5 and 6Bshow the second openings 403 b formed by arranging the adjacent subcolor filter layers to define the openings 403 b.

On the contrary, if the sub color filter layers are formed as an islandtype, the color filter layer 404 may not be formed on the black matrix402, but only between the strips of the black matrix 402. In this case,only the first openings 403 a are formed through the black matrix 402,no second openings 403 b exist, and only the first openings 403 a may beused as a spacer forming hole.

As shown in FIG. 6C, the common electrode 405 for applying an electricfield to the liquid crystal is further formed on the color filter layer404 including the openings 403. The common electrode 405 is formed of atransparent electrode such as an ITO or an IZO. The common electrode 405in the color filter panel may be provided at an LCD device operated by atwisted nematic (TN) mode. However, the common electrode may not beformed in the color filter panel if the LCD device is operated in anin-plane switching mode where a common electrode is formed on the TFTarray panel. In order to prevent external static electricity fromdamaging the LCD device, it is also possible to form an ITO layer at theback surface or the upper surface of the color filter panel and then toperform a color filter process.

As shown in FIG. 6D, an organic layer 406 a is formed on the commonelectrode 405. The organic layer 406 a is for forming the spacer 406,and is photosensitized by a back exposure through the openings 403 a and403 b.

Particularly, after forming the organic layer 406 a, ultraviolet raysare irradiated from the back surface of the substrate 401 onto theorganic layer 406 a, thus to perform a back exposure. In this example,the organic layer 406 a is a negative type such that an exposed regionof the organic layer 406 a is hardened, but a positive type can also beused. The color filter layer 404 includes an ultraviolet ray absorbentmaterial or layer to prevent the ultraviolet light from reachingportions of the organic layer 406 a above the color filter layer 404 atthe time of the back exposure.

In another example, the back-exposure may be performed by using a glassfilter for passing only a certain wavelength and without the use of theultraviolet ray absorbent material in the color filter layer 404. Forinstance, a glass filter is placed below the substrate 401 and isback-exposed. The glass filter passes the rays having a wavelength ofless than 360 nm in the ultraviolet ray region so as to shield or blockout the near blue wavelength of 360 nm or above in the ultraviolet rayregion. Since the organic layer 406 a for forming the spacer 406includes initiators that react to the light having a wavelength in therange of, e.g., 320 nm˜360 nm, the filter glass is used to shield thelight of at least 360 nm in the ultraviolet ray region to preventcertain portions of the organic layer 406 a from reacting to theultraviolet rays, so as to pattern the spacer 406.

After the back-exposure, the organic layer 406 a is developed andcleaned to remove certain portions of the organic layer 406 a andthereby form the spacer 406. A predetermined number of spacer parts ofthe spacer 406 may be formed at each unit pixel with various formsaccording to a model. In order to prevent unnecessary light from beingleaked from the back surface through the openings 403, the spacer 406may be formed of an opaque organic layer for shielding the light.

As a result, as shown in FIG. 6E, the spacer 406 is formed in theopenings 403. In the present invention, the first openings 403 a in theblack matrix 402 and/or the second openings 403 b at the color filterlayer are formed so that the back exposure may be used to form thespacer 406.

Next, the alignment layer 407 for the initial alignment of the liquidcrystal is formed on the spacer 406 and the common electrode 405. As amaterial for the alignment layer 407, a polyimide-based resin may beused. This completes the fabrication of the color filter panel accordingto the present invention.

By the present fabrication method, the spacer 406 is formed by using theback exposure and without the use of an additional mask and the maskprocess.

Furthermore, the first openings 403 a formed in the black matrix 402 andthe second openings 403 b formed in the color filter layer 404 may beformed only by further forming the opening pattern at the mask withoutan additional process, thereby simplifying the entire fabrication methodof the color filter panel.

FIG. 7 is a sectional view showing the structure of the color filterpanel according to another embodiment of the invention. The color filterpanel of FIG. 7 is identical to that of FIG. 6, except that the step offorming an overcoat layer 701 is added. As shown in FIG. 7, tocompensate for a severe step in the color filter layer 404, thetransparent overcoat layer 701 is formed over the color filter layer404, over the black matrix 402, and in the openings 403, so as toplanarize the resultant color filter panel structure. Then the commonelectrode 405, the spacer 406, and the alignment layer 407 are formed asdiscussed above in connection with FIGS. 6C-6E.

It is understood that the present LCD devices mentioned in connectionwith FIGS. 4-7 include elements generally present in related art LCDdevices. For example, the present LCD device includes the related artTFT array panel such as one shown in FIG. 1, a liquid crystal layerbetween the TFT array panel and the present color filter panel, drivingcircuits, etc.

In the present invention, the first openings are 403 a formed atpredetermined portions of the black matrix 402 where the spacer 406 isto be formed, and the second openings 403 b are, optionally, formedbetween the portions of the color filter layer 404 and directly abovethe first openings. These first and second openings, or just the firstopenings if no second openings are formed because, e.g., the colorfilter layer does not overlap the black matrix, are then used toeffectively fabricate the spacer by using the back-exposure without theuse of an additional spacer-forming mask. By reducing the number ofmasks used, the entire process for the color filter panel fabrication issimplified, the fabrication cost is reduced, and thereby theproductivity of the color filter panel is increased. Where the spacercan be formed by the back exposure through the openings, the presentinvention may be applied regardless of whether or not the color filterpanel includes the common electrode and regardless of whether or not thecolor filter panel is provided with the overcoat layer.

As the present invention may be embodied in several forms withoutdeparting from the spirit or essential characteristics thereof, itshould also be understood that the above-described embodiments are notlimited by any of the details of the foregoing description, unlessotherwise specified, but rather should be construed broadly within itsspirit and scope as defined in the appended claims, and therefore allchanges and modifications that fall within the metes and bounds of theclaims, or equivalence of such metes and bounds are therefore intendedto be embraced by the appended claims.

1. A fabrication method for a color filter panel of a display device, comprising: forming a black matrix layer having a first opening on a substrate; forming a color filter layer on the substrate; forming an organic layer on the color filter layer and in the first opening; and forming a spacer by back-exposing the organic layer through the first opening.
 2. The method of claim 1, further comprising: forming a second opening on the first opening and between parts of the color filter layer, wherein the spacer is formed by back-exposing the organic layer through the first and second openings.
 3. The method of claim 2, wherein a size of the second opening is equal to or greater than a size of the first opening.
 4. The method of claim 1, further comprising: forming an overcoat layer on the color filter layer; and forming an alignment layer on the spacer.
 5. The method of claim 1, further comprising: forming a common electrode on the color filter layer; and forming an alignment layer on the common electrode and the spacer.
 6. The method of claim 1, wherein the step of forming the spacer comprises: back exposing the organic layer through the first opening; and developing the exposed organic layer.
 7. The method of claim 2, wherein in the step of forming the color filter layer, the color filter layer includes an ultraviolet ray absorbent material.
 8. The method of claim 1, wherein in the step of forming the spacer, the back-exposing is performed by using a glass filter.
 9. The method of claim 8, wherein the glass filter blocks a wavelength of at least 360 nm.
 10. A color filter panel for a display device, the color filter panel comprising: a substrate; a black matrix layer on the substrate and having a first opening; a color filter layer on the substrate; and a spacer in the first opening.
 11. The color filter panel of claim 10, further comprising: a second opening above the first opening and between parts of the color filter layer, wherein the spacer is in the first and second openings.
 12. The color filter panel of claim 11, wherein a size of the second opening is equal to or greater than a size of the first opening.
 13. The color filter panel of claim 10, further comprising: an overcoat layer on the color filter layer; and an alignment layer on the spacer.
 14. The color filter panel of claim 10, further comprising: a common electrode on the color filter layer; and an alignment layer on the common electrode and the spacer.
 15. The color filter panel of claim 10, wherein the color filter layer includes an ultraviolet ray absorbent material.
 16. The color filter panel of claim 10, wherein the spacer is patterned by using a glass filter.
 17. The color filter panel of claim 16, wherein the glass filter blocks a wavelength of at least 360 nm.
 18. A display device comprising: a thin film transistor (TFT) array panel; a color filter panel; and a liquid crystal layer between the TFT array panel and the color filter panel, wherein the color filter panel includes: a substrate, a black matrix on the substrate and having a first opening, a color filter layer on the substrate, and a spacer in the first opening.
 19. The display device of claim 18, wherein the color filter panel further includes: a second opening on the first opening and between parts of the color filter layer, wherein the spacer is in the first and second openings.
 20. The display device of claim 19, wherein a size of the second opening is equal to or greater than a size of the first opening.
 21. The display device of claim 18, wherein the color filter panel further includes: an overcoat layer on the color filter layer; and an alignment layer on the spacer.
 22. The display device of claim 18, wherein the color filter panel further includes: a common electrode on the color filter layer; and an alignment layer on the common electrode and the spacer.
 23. The display device of claim 18, wherein the color filter layer includes an ultraviolet ray absorbent material.
 24. The display device of claim 18, wherein the spacer is patterned by using a glass filter.
 25. The display device of claim 24, wherein the glass filter blocks a wavelength of at least 360 nm. 